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Microanalyzer, EPMA-8050G

Shimadzu (Japan)

Description

Electron Probe Microanalyzer

By utilizing an advanced electron-optical system with a thermofield emission source (Schottky emitter), the EPMA-8050G microanalyzer delivers unprecedented spatial resolution of SEM images across a wide current range (up to 1 µA). Combined with high-performance X-ray spectrometers, an optical microscope, a dual digital scan converter, and a new workstation, the system achieves outstanding precision in microanalysis.

Features

  • The use of a high-performance Schottky emitter in the electron gun design significantly narrows the beam diameter and provides ultra-high spatial resolution across the entire accelerating voltage range.
  • Image resolution in secondary electrons — 3 nm at 30 kV — is the highest among all EPMA systems.
  • A stable electron beam with a maximum probe current of 3 µA enables high spatial resolution and sensitivity without the need to adjust the objective aperture.
  • The dual-stage vacuum system maintains a constant high vacuum in the electron gun chamber, ensuring beam stability required for precision microanalysis.

Technical Specifications

Voltage Accelerating: 0.5–30 kV with 0.1 kV step (10 V step available for voltages up to 5 kV)
Stage movement speed Along X, Y axes – 15 mm/s; along Z axis – 1 mm/s
Magnification range ×40 – ×400,000
Element range From Be to U / X-ray detection angle: 52.5°
Sensitivity Less than 0.1 wt.%

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